PHOTORESIST ASHING IoN 10V
SINGLE WAFER ASHING SYSTEM
The Photoresist Ashing IoN 10V plasma system is a manual load single wafer RF plasma Ashing, RIE and Descum system. This low cost, mid-sized single wafer system is loaded with advanced features and targets the needs of small scale foundries, universities and start-up companies. The Photoresist Ashing IoN 10V plasma system is equipped with new, state of the art components and software to precisely control processing parameters. This technology has been successfully used for power transistors, analog devices, sensors, optical devices, photonics, MEMS/MOEMS, bio devices, etc. The small footprint of the IoN 10V requires minimal laboratory space and provides for simple installation and maintenance. Leveling casters and brakes allow for easy installation and flexibility.
Features include:
- Small foot print design
- Stainless Steel chamber accommodating up to 8” wafers
- 7” Touch Screen PC Controller with auto and Manual mode operation
- User access control for process development and maintenance programming.
- Plug and play installation
- Pressure Control
Typical application:
- Photoresist stripping
- Wafer descum
- Wafer cleaning prior to wet etching
- SU-8 removal
- Etching of passivation layers
- Reactive IoN Etch (RIE) Configurable
- Batch Wafer System
Technical Data
Process Chamber
- Material Aluminum
- Electrode: 9.0” (230mm) Dia.
- Dimensions 12.68” (322mm) Dia.x3.15”H (80mm)
- Volume 6.51 Liters (.23cu.ft3)
- Process Gas Up to 4 gasses, MFC Controlled
- Base Pressure .07 mbar (50 mTorr)
- Process Pressure .05-1.5 mbar (375-1125 mTorr)
- Evacuation Time ~1 minute
Safety Certification Standards
- CE Certified
- EN 61010
- EN 61326
Plasma Generator
13.56 MHz, 300 Watts
Dimensions
686mm x 1003mm x 1270mm (W x D x H)
27” x 39.5” x 48” (W x D x H)
Weight
134 kg / 295 lbs. depends on options
Facilities Requirements
- Electricity 230V, I ph., 50/60hz, 10a
- Process Gas 1-2 Bar (15-30psi)
- Compressed Air 4-6 Bar, capable of delivering 56 Lpm (intermittent)
- Purge Gas 1.3-2.7 Bar, capable of delivering 28 l/m (intermittent)
Options
- Input power step-up transformer 115-230 VAC
- Temperature controlled plate
- Light tower
- Printer
- Vacuum pump option:
- 12 cfm (20 m3/h)
- 18 cfm (31 m3/h)
- 28 cfm (48 m3/h)
- Dry and Scroll pumps available
