S4100 Plasma system

Did you know that PVA TePla may be able to perform maintenance, repair, or provide spare parts to this system? Please contact our customer service department for further information.
800-527-5667 M-F 8am – 5pm Pacific Time.

Model S4100

• Automatic, single channel, plasma barrel etcher with two process gas inputs.

Reactor Center (PM 11220)

• Quartz chamber (12 in. diameter X 20 in. deep) with hinged access door.
• 3-8 in. wafer compatible
• Optimum load: 50 wafers
• Cover safety interlocks
• Dimensions: 25 in. W X 34 in. D X 17 in. H

RF Generator (112)

• 0-1000 watts @ 13.56 MHz, continuously variable
• Air cooled tube type amplifier
• 200-220VAC/50/60Hz/1Ph/40 FLA (provides all other system power, except pump)

Installation Requirements

• Dry control air, 60 – 80 psig
• Process gases, 15 psig nominal
• Electrical power: 200-220 VAC, 1%, 40 Amps, 50/60 Hz

Controller (4000 C)

• Single program operation
• Two gas flow rotameters, 0-900 sccm (air)
• Switch-selectable step termination options
• Automatic/manual operation
• Analog wattmeter, forward/reflected scales
• Analog pressure display, 0-20 torr
• Digital elapsed timer, 0-99.9 min.
• ON/OFF vacuum, purge, gas and RF switches with indicator lights
• START, CYCLE, and RESET pushbuttons
• Cover safety interlocks
• Color – coded wiring
• Dimensions: 25 in. W X 24 in. D X 10 in. H