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    • PVA TePla America, LLC
    • 251 Corporate Terrace
      Corona, Ca 92879.

    M4L RF Gas Plasma System

    The M4L™ is our most popular full featured plasma surface modification system designed for laboratory and production use.

    The M4L is ideal for:

    • Plasma surface modification
    • Plasma cleaning of organic surfaces
    • Bond strength enhancement
    • Plasma etch applications
    • Plasma asher applications
    • Increased or decreased wettability
    • Any other plasma system application

    The entire bench top system fits in one cabinet, except for the vacuum pump. Never before has a professional plasma etch system been this loaded with features and priced this affordably!

    This system was replaced by the ION 40.
    Click here to continue to the ION 40 webpage.

    Did you know that PVA TePla may be able to perform maintenance, repair, or provide parts to this system? Please contact our customer service department for further information.
    800-527-5667 M-F 8am – 5pm Pacific Time.

    • Controller: Windows® O/S based touch screen interface offering fully automatic control.
    • Multi-step recipes, real time graphic display, multi-level password access, data logging, and real time SPC monitoring of all plasma parameters is provided.
    • Chamber: 9″ X 13″ X 20″ Aluminum, with high-conductance KF 40 port and isolation valve. Optional throttle valve available.
    • Electrode options include 3-shelf, 5-shelf, and cage electrodes.
    • RF Generator: 300 or 600 watt 13.56 MHz air cooled with automatic impedance matching network.
    • Display: Color 10.4 inch touch screen for control and monitoring of process parameters, automatic recipes, or manual plasma treatments.
    • Two user specified gases, with 500 sccm MFCs standard, Optional 3rd gas channel available.
    • Power Requirements: 120- 240 volts, 1ø, 50/60 Hz 30 amps maximum, changeable in the field.
    • CE Certified

    Safety and Security

    • Electronic and software interlocks
    • RF power
    • Pressure
    • Chamber door open/close
    • Emergency OFF front and rear of reactor center and on wall box.
    • Password security for manual and edit modes.
    • Audible alarms.
    • Software alarm limits on critical process parameters.
    • Over-temperature alarm sensor (generator).
    • Hard-wired RF relay interlocked with process chamber door.
    • External interlock connection to extend 24 VAC control loop.