The IoN 10Q Plasma System is a barrel plasma reactor designed for R&D and production applications. The technology is based on the proven reactor designs developed over the course of 50+ years by International Plasma Corporation, Branson IPC, Dionex, Gasonics, Metroline, TePla and finally PVA TePla. PVA TePla is a proven and trusted resource globally for high-quality, reliable, cost-effective and easy to operate Gas Plasma Systems. It offers some of the most advanced and innovative solutions for a wide variety of applications.
Features Include:
Small foot print table top design
Plug and play self installation
Industrial computer with LCD touch panel and keyboard. Windows based operating system
Graphical User Interface (GUI) software complies with CFR Title 21 Part 11 and Semi E95-1101
Multi-level user access
Software
Recipe editor for fast and versatile step controls
Onboard diagnostic features and alarm logging
Remote process monitoring via Ethernet
Online web based simulation/training/support
Typical applications
Photoresist ashing and Descum
Surface cleaning
Surface activation
Technical Data
Process Chamber
Material: Quartz chamber
Dimension: 248 mm D x245 mm L (9.76” x9.65”)
Volume: 11.83 L (0.42 ft3)
Chamber Opening: 241 mm (9.5”) at seal plate
Electrodes: Clam-Shell
Number of MFCs: 1
Process Pressure: (0.16 to 2.66) mbar
(120 to 2000) mTorr
Base Pressure: 0.07 mbar (50 mTorr)
Pumping Time: 1 min (Pump dependent)
Wafer Sizes: Up to 200 mm (8”)
Batch size (Boat): 25 wafers of diameter 150 mm (6”)
Batch size (Plate): 1 wafers of diameter 200 mm (8”)
