IoN 300 Gas Plasma System

The IoN 300 is our latest advancement in vacuum plasma technology. Gas plasma is fast becoming the technology of choice for surface modification of materials in the lifesciences, electronic and industrial arenas due to its versatility and low impact to our environment. For example, the trend towards miniaturization in medical diagnostics requires precision cleaning, and selective chemical functionalization.Plasma removes organic contamination several orders of magnitude more efficiently than wet chemical processing and can chemically functionalize surfaces at the nano-scale.As a result, plasma is replacing older types of treatments that are no longer practical or economical.
The IoN 300 meets the ultra high volume production requirements of our customers, emphasizing versatility and control for their surface treatment needs. Its advanced features provide state of the art process control, fail-safe system alarms and data capturing software. This enables the equipment to meet the stringent control programs in the Life Science industries. The IoN 300 uses radio frequency (RF) generated plasma in a compact, fully integrated package.
One very unique feature of the IoN 300 is the ability to quickly and easily alternate electrodes between multiple shelves (up to 30) or a secondary plasma configuration for multiple use treatments of components.